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1

Reactive etching mechanism of tungsten silicide in CF4-O2 plasma

Year:
1984
Language:
english
File:
PDF, 381 KB
english, 1984
5

Silicon etching mechanism and anisotropy in CF4+O2 plasma

Year:
1983
Language:
english
File:
PDF, 752 KB
english, 1983
6

Doping effects in reactive plasma etching of heavily doped silicon

Year:
1985
Language:
english
File:
PDF, 546 KB
english, 1985
7

Silicon Etching Mechanisms - Doping Effect

Year:
1984
Language:
english
File:
PDF, 340 KB
english, 1984
9

Heating Effects in Reactive Etching of Nb and Nb[sub 2]O[sub 5]

Year:
1984
Language:
english
File:
PDF, 725 KB
english, 1984
10

Wear resistance of iron oxide thin films

Year:
1988
Language:
english
File:
PDF, 570 KB
english, 1988
11

The microstructure of iron oxide thin films

Year:
1988
Language:
english
File:
PDF, 661 KB
english, 1988
12

Laminated CoZr amorphous thin-film recording heads

Year:
1988
Language:
english
File:
PDF, 613 KB
english, 1988
13

Plasma etching of niobium with CF4/O2 gases

Year:
1983
Language:
english
File:
PDF, 627 KB
english, 1983